Method and apparatus for designing a pattern on a semiconductor surface

ABSTRACT

A method of forming a pattern of elements is shown. In one embodiment, the method is used to create a reticle. In another embodiment, the method is used to further form a number of elements on a surface of a semiconductor wafer. Identified problem structures or regions in a pattern of elements are moved from lower level cells of a hierarchy structure into higher level cells before edge movement takes place. Because all cells have been selectively leveled first, substantially all external influences to cells have been removed for each cell before edge movement takes place. The methods and procedures described herein therefore reduce the possibility of undesirable modifications such as electrical shorts. The methods and procedures described herein also reduce overall processing time.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is related to the following co-pending, commonlyassigned U.S. patent application Ser. No. 10/232,853: “PatternGeneration on a Semiconductor Surface,” of which the disclosure isherein incorporated by reference in its entirety.

FIELD OF THE INVENTION

The invention relates to semiconductor devices and device fabrication.Specifically, the invention relates to designing patterns of elementsfor use on a surface of a semiconductor wafer.

BACKGROUND OF THE INVENTION

In fabricating integrated circuits (IC's) on a surface of asemiconductor wafer, a number of electronic devices are formed on orwithin the surface of the wafer. Any of a number of electronic devicesmay be formed on the surface of the wafer, such as transistors,capacitors, diodes, etc. Electronic devices include active areas such asa body region of a transistor, or a source/drain region of a transistor.

After the individual electronic devices are formed on the surface of thewafer, selected electronic devices must be interconnected to form theIC. One typical approach to interconnecting electronic devices is todeposit metal interconnect traces on the surface of the wafer, usuallyon top of the electronic devices. The interconnect traces typically takethe form of trace lines, with a line width that is generally consistentalong a length of the trace line. The traces connect at least one activeregion of a first electronic device with an active region of a secondelectronic device, allowing the devices to communicate with one another,and perform complex operations such as processing or storinginformation.

Trace lines, however, create a rough surface on the wafer with the tracelines as high points, and the spaces between traces as low points. Inmany IC designs, there is a need to form a substantially planar surfaceon the wafer over the trace lines. For example, most IC designs stackmultiple layers of electronic devices on top of each other. Layers oftrace lines interconnect electronic devices on each respective layer,frequently with vias connecting between layers. The surface of eachtrace line layer must be substantially planar, and electrically isolatedin order to form subsequent layers of electronic devices.

One approach in the industry has been to deposit an inter layerdielectric (ILD) over the trace lines. The ILD electrically isolates thetrace line layer, and it can be planarized to form the necessary surfacefor subsequent layers. Current devices and methods design a pattern oftrace lines that merely considers electrical connection of electronicdevices. The effects of the chosen pattern on subsequent waferfabrication steps such as deposition of an ILD layer is not currentlyconsidered. Current devices and methods require multiple steps andmultiple layers for effective isolation and planarization of the traceline layer. Current devices and methods also produce significantvariation in ILD thickness. Current devices and methods are thus morecostly due to additional fabrication steps, and less reliable due toresulting thickness variations. Thick ILD layer regions are undesirable,because formation of subsequent vias is difficult due to the extradistance that the vias must tunnel through. Variation in ILD thicknessis undesirable because, among other problems, subsequent via etchingmust either under etch thick regions, or over etch thin regions of theILD.

As discussed in commonly assigned, co-pending applications, the designof the pattern of elements can influence the effectiveness of subsequentoperations such as deposition of ILD layers. Computer programs existthat are used to generate patterns of elements such as trace lines, andcan be used to modify planned patterns of elements. The computerprograms typically generate a pattern for a chip or an entire die usingcombinations of smaller pattern organization devices called cells. Acell can contain shapes or instances, or both shapes and instances. Ashape is defined as a collection of data that defines geometry of astructure such as a trace line. An instance is defined as dataindicating a placement of another cell within the current cell, but notincluding the actual shape geometry data. Cells are arranged in ahierarchy that includes low level cells, intermediate level cell, highlevel cells, etc. High level cells typically include large numbers oflower level cells, and the relationship of lower level cells within highlevel cells is frequently complicated. The use of cells arranged in ahierarchy is convenient for designing and making modifications to apattern of elements, because repeating modifications can be made at theappropriate level within the hierarchy, and the changes will be repeatedthroughout similar level cells. Recognizing and utilizing repeatingpatterns reduces processing time for a computer or similar dataprocessor during the design and modification process.

A problem arises, however, when performance of a selected cell in aselected level within the hierarchy is influenced by factors external tothe selected cell, such as factors from a separate adjacent cell.Without knowledge of the characteristics of cells external to a selectedcell or cells, modifications can fail to accomplish the design goals ofthe modification, or the modification can introduce new problems in thepattern of elements.

What is needed is a method of design and modification for patterns ofelements that allows consideration of a region within the pattern thatis inclusive enough to encompass substantially all relevant features sothat they can be considered in design and modification. What is alsoneeded is a method of design and modification with a short processingtime.

SUMMARY OF THE INVENTION

A method of forming a pattern of elements for use on a semiconductorwafer is shown. In one embodiment, the method includes generating anumber of cells organized in a hierarchy. The method also includesidentifying a first cell including a region to be modified on a firsthierarchy level and identifying a second cell on a second hierarchylevel that influences characteristics of the first cell. The method alsoincludes moving at least a portion of the first cell from the firsthierarchy level to a higher level cell in the hierarchy that is commonwith the second cell. The method also includes moving at least a portionof the second cell from the second hierarchy level to the higher levelcell, wherein the higher level cell is free of external influences. Themethod also includes modifying the higher level cell.

A machine-readable medium with instructions stored thereon is shown.When the instructions are executed, in one embodiment, they causegeneration of a number of cells organized in a hierarchy. Theinstructions also cause identification of a first cell including aregion to be modified on a first hierarchy level and identification of asecond cell on a second hierarchy level that influences characteristicsof the first cell. The instructions also cause moving of at least aportion of the first cell from the first hierarchy level to a higherlevel cell in the hierarchy that is common with the second cell. Theinstructions also cause moving of at least a portion of the second cellfrom the second hierarchy level to the higher level cell, wherein thehigher level cell is free of external influences. The instructions alsocause modification of the higher level cell.

These and other embodiments, aspects, advantages, and features of thepresent invention will be set forth in part in the description whichfollows, and in part will become apparent to those skilled in the art byreference to the following description of the invention and referenceddrawings or by practice of the invention. The aspects, advantages, andfeatures of the invention are realized and attained by means of theinstrumentalities, procedures, and combinations particularly pointed outin the appended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A shows an embodiment of a planned surface of a semiconductorwafer with a number of elements and spaces defined.

FIG. 1B shows an embodiment of a planned surface of a semiconductorwafer with a number of elements and spaces defined.

FIG. 1C shows an embodiment of a planned surface of a semiconductorwafer with additional regions defined.

FIG. 2 shows a hierarchy structure.

FIG. 3A shows a pair of cells.

FIG. 3B shows the pair of cells from FIG. 3A after a first modification.

FIG. 3C shows the pair of cells from FIG. 3A after a secondmodification.

FIG. 4 shows a pair of cells.

FIG. 5 shows another pair of cells after a modification.

FIG. 6 shows another pair of cells.

FIG. 7 shows a flow chart of one embodiment of forming a pattern ofelements.

FIG. 8 shows a block diagram of the hardware and operating environmentof a suitable computer in conjunction with which embodiments of theinvention may be practiced.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

In the following detailed description of the invention, reference ismade to the accompanying drawings which form a part hereof, and in whichis shown, by way of illustration, specific embodiments in which theinvention may be practiced. In the drawings, like numerals describesubstantially similar components throughout the several views. Theseembodiments are described in sufficient detail to enable those skilledin the art to practice the invention. Other embodiments may be utilizedand structural, logical, and electrical changes may be made withoutdeparting from the scope of the present invention. The terms wafer andsubstrate used in the following description include any structure havingan exposed surface with which to form the integrated circuit (IC)structure of the invention. The term substrate is understood to includesemiconductor wafers. The term substrate is also used to refer tosemiconductor structures during processing, and may include otherlayers, such as silicon-on-insulator (SOI), etc. that have beenfabricated thereupon. Both wafer and substrate include doped and undopedsemiconductors, epitaxial semiconductor layers supported by a basesemiconductor or insulator, as well as other semiconductor structureswell known to one skilled in the art. The term conductor is understoodto include semiconductors, and the term insulator or dielectric isdefined to include any material that is less electrically conductivethan the materials referred to as conductors.

The term “horizontal” as used in this application is defined as a planeparallel to the conventional plane or surface of a wafer or substrate,regardless of the orientation of the wafer or substrate. The term“vertical” refers to a direction perpendicular to the horizontal asdefined above. Prepositions, such as “on”, “side” (as in “sidewall”),“higher”, “lower”, “over” and “under” are defined with respect to theconventional plane or surface being on the top surface of the wafer orsubstrate, regardless of the orientation of the wafer or substrate. Thefollowing detailed description is, therefore, not to be taken in alimiting sense, and the scope of the present invention is defined onlyby the appended claims, along with the full scope of equivalents towhich such claims are entitled.

Embodiments as described below include a new hierarchy management thatleaves cellview placements unchanged, but moves shapes into a higherlevel of the hierarchy to account for neighboring cell views and metalshapes in higher hierarchy cells. One embodiment of the hierarchymanagement flattens cells specific to the design (contacts, vias, corecells, etc.). One embodiment of the hierarchy management levels a shapesarea by moving all interacting (butting, overlapping, etc.) shapes ofthe area upwards in the hierarchy until they are connected. Oneembodiment of the hierarchy management generates a ring which consistsof butting edges between selected regions to verify that a TODO area iscompletely surrounded by other areas and levels this ring into thehierarchy of the area. In one embodiment of the hierarchy management,all TODO areas are split into shapes which are completely inside certaincells. In one embodiment of the hierarchy management, TODO areas are notsplit up between different cells or in different hierarchy levels. Inone embodiment of the hierarchy management, an algorithm such as CadenceDIVA/SKILL is invoked to fill the structure. In one embodiment of thehierarchy management, the Cadence DIVA/SKILL program is used to checkthe results of the new hierarchy management.

FIG. 1A shows a first planned surface 100 of a semiconductor wafer. Inone embodiment, the first planned surface 100 is not in a final state.In one embodiment, the first planned surface has not been put into apermanent physical form such as in a reticle for photolithographicprocessing, or a pattern of physical trace lines. In one embodiment, thefirst planned surface 100 is defined by data stored on a machinereadable media, such as a computer memory, a hard disk drive, a floppydisk, optical storage, other storage media, etc.

The first planned surface 100 includes a number of conductive elements102, each defined by a number of edges 104. In one embodiment, theconductive elements include a metal. In one embodiment, a single elementmetal, such as aluminum is used. In one embodiment, a metal is includedin an alloy. Other conductive materials are also possible, such assemiconductors. In one embodiment, the conductive elements 102 includetrace lines. In one embodiment, the conductive elements 102 are adaptedto interconnect at least a pair of active regions, such as source/drainregions of transistors. In one embodiment, the conductive elements 102of the first planned surface 100 are located based primarily onelectrical considerations of interconnecting a number of active regions.In FIG. 1A, the edges 104 of the conductive elements 102 define a numberof spaces 106 between elements. Along a chosen direction, such as aY-direction, a dimension of the spaces 106 can be measured.

FIG. 1B shows a number of elements 110 which are shaped in rectanglesfor ease of illustration. One embodiment of the invention includes a setof dimensional rules that apply to elements such as the number ofelements 110. The following description of dimensional rules betweenelements 110 is applicable to the conductive elements 102 shown in FIG.1A. In FIG. 1B, all dimensions are measured along direction 111. One ofordinary skill in the art, with the benefit of the present disclosure,will recognize that although the single direction 111 is shown in FIG.1B, the rules described herein regarding element and space dimensionsare applicable to any chosen measurement direction in a pattern ofelements.

Element 130 is shown with a threshold dimension 116. Element 140 isshown with a second dimension 112 that is greater than the thresholddimension 116. Element 130 is shown separated from element 140 by a DRCgap 114. In one embodiment, the DRC gap is defined as the minimumspacing dimension that can be located adjacent to an element with anelement dimension larger than the threshold dimension 116. As shown,element 140 includes the second dimension 112 that is larger than thethreshold dimension 116, therefore the minimum separation betweenelements 140 and 130 is the DRC gap 114.

Element 150 is shown with a third dimension 119 that is smaller that thethreshold dimension 116. In one embodiment, the third dimension 119 isdefined as a minimum lithographic line width. Element 150 is showndirectly adjacent to a first space 152 and a second space 154. The firstspace 152 is shown with a minimum space dimension 118. In oneembodiment, the first space 152 and the second space 154 havesubstantially the same minimum space dimension 118. An SLS dimension 120is defined as being substantially equal to a space+line+space (SLS)where the line is the minimum lithographic line dimension, and the twoadjacent spaces are both equal to the minimum lithographic space asformed when adjacent to a minimum lithographic line dimension.

It should be noted that the minimum space dimension 118 is smaller thanthe DRC gap 114. This is allowed due to lithographic techniques thatallow thin spaces, but only when they are adjacent to elements thinnerthan a certain dimension. In one embodiment, elements that are thinenough to be located next to a space smaller than DRC gap 114 must haveelement dimensions in a limited range. In one embodiment, the limitedrange includes the minimum lithographic line width 119 and the limitedrange can be as large as the threshold dimension 116.

A third space 156 is further shown in FIG. 1B with a dimension 122 thatis greater than the SLS dimension 120. In one embodiment, a FLOAT areais defined as an area with dimensions that are large enough to allowinsertion of at least one element within the FLOAT area while complyingwith the above described dimensional rules. Additional elements within aFLOAT area, in one embodiment, are referred to a floating elementsbecause they are not coupled to any active areas of electronic devices.The additional elements are electrically “floating” on top of anisolated substrate region. In one embodiment, floating elements areincluded to improve subsequent ILD layer deposition kinetics asdiscussed below.

In FIG. 1B, the dimension 122 of the third space 156 allows insertion ofan additional element, and thus qualifies as a FLOAT space dimension. Itshould be noted that the smallest dimension of a FLOAT area dimensiondepends on the dimensions of the elements that surround the area. Theminimum lithographic line width 119 remains the same in one embodimentfor all configurations. However, according to the dimensional rulesabove, if surrounding elements include one or more “large” elements withdimensions greater than the threshold dimension 116, then the DRC gap114 is needed adjacent to the floating element. Likewise, if surroundingelements include one or more elements with dimensions less than or equalto the threshold dimension 116, then a space as small as the minimumspace dimension 118 can be used. In one embodiment, a FLOAT areaincludes both DRC gap 114 dimensions surrounding a floating element andminimum space dimensions 118 surrounding the floating element.

A TODO area is defined as a space between elements with at least onedimension that is larger than DRC gap 114 where the space is also notlarge enough to insert a floating element under the above dimensionalrules. TODO areas are located in a pattern of elements and modified toprovide for an improved ILD process as described below.

Dimensional rules such as the rules described above are driven bysubsequent wafer processing steps in one embodiment. As discussed above,it is often desirable to form subsequent structure such as an interlayer dielectric (ILD) between elements on a wafer, such as conductiveelements 102 from FIG. 1A. In many designs, the ILD must besubstantially planar, and a thin, consistent ILD layer is more desirabledue to subsequent addition of conductive vias through the ILD.

It has been discovered that the deposition process of an ILD layer usingprocesses such as spin-on-glass or CVD is not isotropic. Spaces ofdifferent sizes and dimensions fill at different rates. Anisotropic fillrates are minimized by controlling space dimensions, which leads to amore consistent, planar ILD surface, and a more simple fabricationprocess for deposition and planarization of the ILD surface. Dimensionalrules, in one embodiment, are chosen based on these ILD fill dynamicsconsiderations. Dimensions such as the DRC gap 114, the minimum spacedimension 118, etc. provide an ILD deposition process requiring fewersteps, resulting in a thinner, more planar, more consistent ILD layerthat is more reliable. Likewise, in one embodiment, the addition offloating elements is driven by the desire for spaces between elements ina pattern that are more easily filled and planarized in a subsequent ILDprocess. In one embodiment, a pattern of elements utilizing dimensionalrules as described above can be filled and planarized in a singleprocessing operation.

FIG. 1C shows the spaces 106 of FIG. 1A further divided into categoriesbased on the dimensions of the spaces 106 and the dimensional rulesabove. The first planned surface 100, in FIG. 1C, shows a FLOAT region160. The first planned surface 100 in FIG. 1C also includes a number ofTODO regions 170. In one embodiment, the dimensions of elements andspaces in the first planned surface 100 are measured substantially alongX and Y directions as indicated in the Figures. One skilled in the art,having the benefit of the present disclosure, will recognize that adimension of the spaces 106 can be alternatively measured on any of awide range of directions other than X and Y directions. Further, thespaces 106, in embodiments such as the one shown in FIG. 1A and FIG. 1C,frequently include complex shapes, that contain a number of widths inany given direction, depending on the particular portion of the space106 that is measured.

As described in the co-pending application “Pattern Generation on aSemiconductor Surface,” Edges of elements surrounding TODO regions aremoved using a set of movement rules to form a pattern of elements withspaces between elements that conform to dimensional rules as describedabove. Although a specific set of dimensional rules is shown that drivesmodification of elements, embodiments of the present invention areuseful with any of a number of possible dimensional rules or movementrules. The edge movement process pursuant to a given set of movementrules frequently uses a considerable amount of processor time in thecomputing environment. If the movement process is performed at eachlevel, consecutively within the hierarchy of cells, the process ofmoving edges of elements for an entire die can take as long as sevenhours. The processing time needed is made longer due to a problem withcertain TODO regions in adjacent cells on different levels in thehierarchy.

FIG. 2 shows one embodiment of a simple hierarchy 200 that includes CellA in a high level 210. Cell B and Cell C are intermediate level cellsthat are included within Cell A on level 220. Cell D and Cell E arefurther included within Cell B on a lower level 230. FIG. 3A shows theshapes of Cell B and Cell C together for purposes of illustration. Inthe current hierarchy structure, when viewing or modifying Cell B, theshapes in Cell B would visible along with shapes below Cell B in thehierarchy, such as any shapes in Cell D or Cell E. Shapes in Cell C,however, would not be visible, because Cell B and Cell C are only linkedat level 210 of the hierarchy through Cell A. The shapes of Cell B andCell C are shown together in FIG. 3A to illustrate a problem that occurswhen cells are modified separately without knowledge of each other ortheir influence on each other.

Cell C includes a first element 310, a second element 312, and a TODOspace region 314 between the first and second elements 310, 312.Likewise Cell B includes a first element 320 and a second element 322with a TODO space 324 between. The TODO space 314 of Cell B shares aboundary 326 with the TODO space 324 of Cell B.

FIG. 3B shows Cell B and Cell C after a modification. If cells aremodified by themselves, without all relevant information external to thelevel, a problem as illustrated in FIG. 3B can develop. TODO region 324of Cell B is modified by moving edge 326 of element 322 along direction327 to a new location 328. The new location 328 of the edge complieswith the dimensional rules as discussed above. Likewise progressingthrough the level 220, Cell C is later modified without knowledge ofCell B. In modifying Cell C, TODO region 314 is modified by moving edge316 of element 310 along direction 317 to a new location 318. The newlocation 318 of the edge also complies with the dimensional rules asdiscussed above. However, because Cell B was modified without knowledgeof Cell C, and Cell C was likewise modified without knowledge of Cell B,An undesirable condition such as an electrical short at point 350 hasbeen created.

FIG. 3C shows one embodiment of a desirable condition after modifyingthe TODO region 314 of Cell C, and the TODO region 324 of Cell B.Similar to FIG. 3B, TODO region 324 is modified by moving edge 326 ofelement 322 along direction 327 to a new location 328. However, in CellC, the TODO region 314 is modified by moving edge 332 of element 312along direction 333 to a new location 334. The resulting pattern in thetwo cells conforms to dimensional rules as described above, and does notcreate undesirable conditions such as an electrical short.

Because modifications on multiple levels of the hierarchy consume largeamounts of processor time, a new method that reduces processor time isdesirable. Further, as discussed above, factors external to individuallevels in a hierarchy have an effect on other levels in the hierarchythat can lead to negative designs, such as a short.

FIG. 4 shows a first cell 401 and a second cell 402. In one embodiment,the first cell 401 is organized in a hierarchy structure where it cannotsee the second cell 402. However, similar to FIGS. 3A-3C, FIG. 4 showsthe shapes of the first cell 401 and the second cell 402 together forpurposes of illustration. When shown together, the first cell 401 abutsthe second cell 402 along line 403. The cells 401 and 402 contain datafor forming a number of elements 410, a first TODO region 420, a secondTODO region 421, and a number of spaces that conform to dimensionalrules 430. In one embodiment, the number of elements include conductivetrace lines, although the invention is not so limited. Any of a numberof patterns of elements that benefit from improved subsequent layerdeposition/planarization will benefit from embodiments of the presentdisclosure.

In one embodiment, each cell is assessed by checking borders of TODOregions. In FIG. 4, the first TODO region 420 in the first cell 401 isbounded by an element 410, a space that conform to dimensional rules430, and one edge of the TODO region is located on the edge of the firstcell 401. When the first cell 401 is seen by itself, without knowledgeof abutting cells, the type of element or region located on one edge ofthe TODO region 420 is therefore not known. When viewing both the firstcell 401 and the second cell 402 together, the first TODO region 420 isshown to share a border 422 with the second TODO region 421. Asillustrated in one possible example from FIGS. 3A-3C, a TODO region thathas a boundary across cells can create undesired problems such aselectrical shorts.

In one embodiment, a test that is used to detect if external cells havean influence on a selected level includes testing TODO regions to see ifthey are bounded on all sides by elements 410, or spaces that conform todimensional rules 430. In one embodiment, if the type of element orregion located on an edge of a TODO region is not known, a furthermodification to the hierarchy is performed before edges of elements aremoved. In one embodiment, if a TODO region abuts a TODO region fromanother level, a further modification to the hierarchy is performedbefore edges of elements are moved.

FIG. 5 shows a first cell 501 and a second cell 502. The first cell 501abuts the second cell 502 along line 503. The cells 501 and 502 containdata for forming a number of elements 510, a first TODO region 520, asecond TODO region 521, and a number of spaces that conform todimensional rules 530. In FIG. 5, the first cell 501 is selected for amodification such as edge movement of elements 510 adjacent the TODOregion. The first TODO region 520 is identified because when lookingonly at the first cell 501, the type of element or region located on anedge of the first TODO region 520 is not known.

In one embodiment, identified regions such as TODO region 520 and 521are moved into higher level cells in the hierarchy until the identifiedregions are bounded by a ring 522. In one embodiment FIG. 5 shows alevel of the hierarchy that is sufficiently high to show both first cell501 and second cell 502. The first TODO region 520 and the second TODOregion 521 have been removed from lower level cells where they wereidentified as potential problem regions. The first TODO region 520 andthe second TODO region 521 are now bounded only by known regions such aselements 510 or spaces that conform to dimensional rules 530. The ring522 indicates this desirable condition. In one embodiment, the cells ona given level are in condition for edge movement once a ring 522 isestablished where no other portions of a TODO region are abutting thering and outside the ring.

The procedure of cell “leveling” as described above ensures thatundesirable results such as electrical shorts as described in FIGS.3A-3C do not occur during an edge movement procedure. Further, theprocedure of cell “leveling” as described above remove the need tocreate extra cells during the edge moving process. Further, theprocedure of cell “leveling” as described above reduces the processortime needed for moving edges of elements from around 7 hours toapproximately 30 minutes.

FIG. 6 shows a cell pattern 600. The cell pattern 600 includes a numberof elements 610, a TODO region 620 and a number of spaces that conformto dimensional rules 630. In one embodiment, the cell pattern 600 hasbeen “leveled” according to the methods described above. The TODO region620 in one embodiment is made up of portions of TODO regions from lowerlevel cells that have been moved out of the low level cells and into thecell pattern 600. In one embodiment, additional structures such asselected elements 610 have also been moved out of their respective lowerlevel cells and into the cell pattern 600. In one embodiment, allstructures such as elements 610 are moved to a higher level cell in thehierarchy if the structures fall within or abut an area such as the areadefined within line 640. In one embodiment, the line 640 is spaced anequal distance 642 away from a ring 622. The ring 622 as described inprevious embodiments, defines a TODO region that has known structures onall sides of the TODO region such as elements 610 or spaces that conformto dimensional rules 630. The distance 642 of the line 640, in oneembodiment, is defined by line-space considerations as described inco-pending application “Pattern Generation on a Semiconductor Surface.”By moving all structures if the structures fall within or abut the areawithin line 640 further external influences to the selected cell, andspecifically the TODO region 620 bounded by the ring 622 are included inone cell on one hierarchy level.

FIG. 7 shows a flowchart of one embodiment of forming a pattern ofelements using the rules and methods as described above. Identifiedproblem structures or regions are shown as moved from lower level cellsinto higher level cells before edge movement takes place. Because allcells have been selectively leveled first, substantially all externalinfluences to cells have been removed for each cell before edge movementtakes place. The methods and procedures described herein thereforereduce the possibility of undesirable modifications such as electricalshorts. Further, the methods and procedures described herein reduce thenumber of cells that must be modified by an edge movement step. Thisfactor along with other aspects of the current invention allows theoverall processing time of the current method to be substantiallyreduced over other methods. In one embodiment the processor time foredge movements is reduced from 7 hours to 30 minutes.

FIG. 8 provides a brief, general description of a suitable computingenvironment in which the above embodiments may be implemented.Embodiments of the invention will hereinafter be described in thegeneral context of computer-executable program modules containinginstructions executed by a personal computer (PC). Program modulesinclude routines, programs, objects, components, data structures, etc.that perform particular tasks or implement particular abstract datatypes. Those skilled in the art will appreciate that the invention maybe practiced with other computer-system configurations, includinghand-held devices, multiprocessor systems, microprocessor-basedprogrammable consumer electronics, network PCs, minicomputers, mainframecomputers, and the like which have multimedia capabilities. Theinvention may also be practiced in distributed computing environmentswhere tasks are performed by remote processing devices linked through acommunications network. In a distributed computing environment, programmodules may be located in both local and remote memory storage devices.

FIG. 8 shows a general-purpose computing device in the form of aconventional personal computer 20, which includes processing unit 21,system memory 22, and system bus 23 that couples the system memory andother system components to processing unit 21. System bus 23 may be anyof several types, including a memory bus or memory controller, aperipheral bus, and a local bus, and may use any of a variety of busstructures. System memory 22 includes read-only memory (ROM) 24 andrandom-access memory (RAM) 25. A basic input/output system (BIOS) 26,stored in ROM 24, contains the basic routines that transfer informationbetween components of personal computer 20. BIOS 26 also containsstart-up routines for the system. Personal computer 20 further includeshard disk drive 27 for reading from and writing to a hard disk (notshown), magnetic disk drive 28 for reading from and writing to aremovable magnetic disk 29, and optical disk drive 30 for reading fromand writing to a removable optical disk 31 such as a CD-ROM or otheroptical medium. Hard disk drive 27, magnetic disk drive 28, and opticaldisk drive 30 are connected to system bus 23 by a hard-disk driveinterface 32, a magnetic-disk drive interface 33, and an optical-driveinterface 34, respectively. The drives and their associatedcomputer-readable media provide nonvolatile storage of computer-readableinstructions, data structures, program modules and other data forpersonal computer 20. Although the exemplary environment describedherein employs a hard disk, a removable magnetic disk 29 and a removableoptical disk 31, those skilled in the art will appreciate that othertypes of computer-readable media which can store data accessible by acomputer may also be used in the exemplary operating environment. Suchmedia may include magnetic cassettes, flash-memory cards, digitalversatile disks, Bernoulli cartridges, RAMs, ROMs, and the like.

Program modules may be stored on the hard disk, magnetic disk 29,optical disk 31, ROM 24 and RAM 25. Program modules may includeoperating system 35, one or more application programs 36, other programmodules 37, and program data 38. A user may enter commands andinformation into personal computer 20 through input devices such as akeyboard 40 and a pointing device 42. Other input devices (not shown)may include a microphone, joystick, game pad, satellite dish, scanner,or the like. These and other input devices are often connected to theprocessing unit 21 through a serial-port interface 46 coupled to systembus 23; but they may be connected through other interfaces not shown inFIG. 9, such as a parallel port, a game port, or a universal serial bus(USB). A monitor 47 or other display device also connects to system bus23 via an interface such as a video adapter 48. In addition to themonitor, personal computers typically include other peripheral outputdevices (not shown) such as speakers and printers. In one embodiment,one or more speakers 57 or other audio output transducers are driven bysound adapter 56 connected to system bus 23.

Personal computer 20 may operate in a networked environment usinglogical connections to one or more remote computers such as remotecomputer 49. Remote computer 49 may be another personal computer, aserver, a router, a network PC, a peer device, or other common networknode. It typically includes many or all of the components describedabove in connection with personal computer 20; however, only a storagedevice 50 is illustrated in FIG. 9. The logical connections depicted inFIG. 9 include local-area network (LAN) 51 and a wide-area network (WAN)52. Such networking environments are commonplace in offices,enterprise-wide computer networks, intranets and the Internet.

When placed in a LAN networking environment, PC 20 connects to localnetwork 51 through a network interface or adapter 53. When used in a WANnetworking environment such as the Internet, PC 20 typically includesmodem 54 or other means for establishing communications over network 52.Modem 54 may be internal or external to PC 20, and connects to systembus 23 via serial-port interface 46. In a networked environment, programmodules, such as those comprising Microsoft® Word which are depicted asresiding within 20 or portions thereof may be stored in remote storagedevice 50. Of course, the network connections shown are illustrative,and other means of establishing a communications link between thecomputers may be substituted.

Software that may be used with embodiments of the invention as describedabove include, but are not limited to software programs such asHERCULES, AVANTI, CADENCE, DIVA, and SKILL. Software may be designedusing many different methods, including object oriented programmingmethods. C++ and Java are two examples of common object orientedcomputer programming languages that provide functionality associatedwith object oriented programming. Object oriented programming methodsprovide a means to encapsulate data members (variables) and memberfunctions (methods) that operate on that data into a single entitycalled a class. Object oriented programming methods also provide a meansto create new classes based on existing classes.

An object is an instance of a class. The data members of an object areattributes that are stored inside the computer memory, and the methodsare executable computer code that act upon this data, along withpotentially providing other services. The notion of an object isexploited in the present invention in that certain aspects of theinvention are implemented as objects in one embodiment.

An interface is a group of related functions that are organized into anamed unit. Each interface may be uniquely identified by someidentifier. Interfaces have no instantiation, that is, an interface is adefinition only without the executable code needed to implement themethods which are specified by the interface. An object may support aninterface by providing executable code for the methods specified by theinterface. The executable code supplied by the object must comply withthe definitions specified by the interface. The object may also provideadditional methods. Those skilled in the art will recognize thatinterfaces are not limited to use in or by an object orientedprogramming environment.

Conclusion

Computers and computer-executable program modules, etc are used in oneembodiment of the invention to generate patterns as described above foruse on a semiconductor surface. The detailed description of the methodand associated devices above is used, in one embodiment, to create areticle for lithography of a semiconductor wafer surface. In oneembodiment, a pattern on the reticle is first generated using computersoftware to interconnect a number of active areas on the wafer. Thefirst pattern is not physically formed, and it's pattern is stored asdata for modification as described above. The first pattern is thenmodified according to the teachings above to create a pattern. Infurther embodiments, a semiconductor wafer is formed using the reticlegenerated by the method of the software described above. Elements suchas metal trace lines are formed on the wafer in one embodiment, althoughthe invention is not limited to metal trace lines.

In modifying the first pattern of elements, identified problemstructures or regions are moved from lower level cells in a hierarchyinto higher level cells before edge movement takes place. Because allcells have been selectively leveled first, substantially all externalinfluences to cells have been removed for each cell before edge movementtakes place. The methods and procedures described herein thereforereduce the possibility of undesirable modifications such as electricalshorts. Further, the methods and procedures described herein reduce thenumber of cells that must be modified by an edge movement step. Thisfactor along with other aspects of the current invention allows theoverall processing time of the current method to be substantiallyreduced over other methods. In one embodiment the processor time foredge movements is reduced from 7 hours to 30 minutes.

Although specific embodiments have been illustrated and describedherein, it will be appreciated by those of ordinary skill in the artthat any arrangement which is calculated to achieve the same purpose maybe substituted for the specific embodiment shown. This application isintended to cover any adaptations or variations of the presentinvention. It is to be understood that the above description is intendedto be illustrative, and not restrictive. Combinations of the aboveembodiments, and other embodiments will be apparent to those of skill inthe art upon reviewing the above description. The scope of the inventionincludes any other applications in which the above structures andfabrication methods are used. The scope of the invention should bedetermined with reference to the appended claims, along with the fullscope of equivalents to which such claims are entitled.

1. A method of forming a pattern of elements for use on a semiconductorwafer, comprising: generating a number of cells organized in ahierarchy; identifying a first cell including a region to be modified ona first hierarchy level; identifying a second cell on a second hierarchylevel that influences characteristics of the first cell; moving at leasta portion of the first cell from the first hierarchy level to a higherlevel cell in the hierarchy that is common with the second cell; movingat least a portion of the second cell from the second hierarchy level tothe higher level cell, wherein the higher level cell is free of externalinfluences; and modifying the higher level cell.
 2. The method of claim1, wherein generating the number of cells includes generating a numberof cells that include a number of conductive elements whose edges definea number of spaces between the elements.
 3. The method of claim 2,wherein generating the number of cells that include a number ofconductive elements includes generating a number of cells that include anumber of metal trace lines.
 4. The method of claim 1, wherein the firsthierarchy level and the second hierarchy level are the same hierarchylevel.
 5. The method of claim 1, wherein identifying the second cell onthe second hierarchy level that influences characteristics of the firstcell includes identifying a second cell on a second hierarchy levelincluding a second region to be modified that is adjacent to the firstregion to be modified.
 6. The method of claim 5, wherein prior tomodifying the higher level cell, the first region to be modified and thesecond region to be modified are both isolated from other regions to bemodified.
 7. A method of forming a pattern of elements for use on asemiconductor wafer, comprising: generating a number of cells organizedin a hierarchy; testing an area of a first cell, the area surrounding aregion to be modified; identifying a second cell that influencescharacteristics of the first cell; moving a portion of the first cellthat abuts or is contained within the area from the first cell to ahigher level cell in the hierarchy that is common with the second cell;moving at least a portion of the second cell to the higher level cell inthe hierarchy, wherein the higher level cell is free of externalinfluences; modifying the region to be modified in the higher levelcell.
 8. The method of claim 7, wherein generating the number of cellsincludes generating a number of cells that include conductive elementswith spaces defined between the conductive elements.
 9. The method ofclaim 8, wherein generating the number of cells that include conductiveelements includes generating a number of cells that include metal tracelines.
 10. The method of claim 7, wherein the region to be modifiedincludes a space between elements with a space dimension to be modified.11. The method of claim 7, wherein testing the area of the first cellincludes a region which is sized larger than the region to be modifiedby a test distance.
 12. The method of claim 10, wherein testing the areaof the first cell includes testing the area of the first cell toidentify elements adjacent to the space with a dimension larger that athreshold dimension.
 13. The method of claim 7, wherein modifying theregion to be modified includes moving edges of elements that areadjacent to the region to be modified.
 14. A method of forming areticle, comprising: generating a number of cells that form a pattern ofelements, the cells being organized in a hierarchy; identifying a firstcell including a region to be modified on a first hierarchy level;identifying a second cell on a second hierarchy level that influencescharacteristics of the first cell; moving at least a portion of thefirst cell from the first hierarchy level to a higher level cell in thehierarchy that is common with the second cell; moving at least a portionof the second cell from the second hierarchy level to the higher levelcell, wherein the higher level cell is free of external influences;modifying the region to be modified in the higher level cell; andprinting the pattern of elements on a reticle substrate after modifyingthe higher level cell.
 15. The method of claim 14, wherein generatingthe number of cells includes generating a number of cells that include anumber of conductive elements whose edges define a number of spacesbetween the elements.
 16. The method of claim 15, wherein generating thenumber of cells that include the number of conductive elements includesgenerating a number of cells that include a number of metal trace lines.17. The method of claim 14, wherein the first hierarchy level and thesecond hierarchy level are the same hierarchy level.
 18. The method ofclaim 14, wherein identifying the second cell on the second hierarchylevel that influences characteristics of the first cell includesidentifying a second cell on a second hierarchy level including a secondregion to be modified that is adjacent to the first region to bemodified.
 19. The method of claim 18, wherein moving at least a portionof the second cell from the second hierarchy level into the firsthierarchy level includes moving the second region to be modified fromthe second hierarchy level into the first hierarchy level.
 20. A methodof forming a reticle, comprising: generating a number of cells that forma pattern of elements, the cells being organized in a hierarchy; testingan area of a first cell, the area surrounding a region to be modified;identifying a second cell that influences characteristics of the firstcell; moving a portion of the first cell that abuts or is containedwithin the area from the first cell to a higher level cell in thehierarchy that is common with the second cell; moving at least a portionof the second cell to the higher level cell in the hierarchy, whereinthe higher level cell is free of external influences; modifying theregion to be modified in the higher level cell; and printing the patternof elements on a reticle substrate after modifying the region.
 21. Themethod of claim 20, wherein generating the number of cells includesgenerating a number of cells that include conductive elements withspaces defined between the conductive elements.
 22. The method of claim21, wherein generating the number of cells that include conductiveelements includes generating a number of cells that include metal tracelines.
 23. The method of claim 20, wherein the region to be modifiedincludes a space between elements with a space dimension to be modified.24. The method of claim 20, wherein testing the area of the first cellincludes a region which is sized larger than the region to be modifiedby a test distance.
 25. The method of claim 23, wherein testing the areaof the first cell includes testing the area of the first cell toidentify elements adjacent to the space with a dimension larger that athreshold dimension.
 26. The method of claim 20, wherein modifying theregion to be modified includes moving edges of elements that areadjacent to the region to be modified.
 27. A method of forming a patternof elements on a semiconductor surface, comprising: forming a reticle,including: generating a number of cells that form a pattern of elements,the cells being organized in a hierarchy; identifying a first cellincluding a region to be modified on a first hierarchy level;identifying a second cell on a second hierarchy level that influencescharacteristics of the first cell; moving at least a portion of thefirst cell from the first hierarchy level to a higher level cell in thehierarchy that is common with the second cell; moving at least a portionof the second cell from the second hierarchy level to the higher levelcell, wherein the higher level cell is free of external influences; andmodifying the higher level cell; printing the pattern of elements on areticle substrate after modifying the region; and forming the pattern ofelements on a semiconductor surface using the reticle.
 28. The method ofclaim 27, wherein generating the number of cells includes generating anumber of cells that include a number of conductive elements whose edgesdefine a number of spaces between the elements.
 29. The method of claim28, wherein generating the number of cells that include a number ofconductive elements includes generating a number of cells that include anumber of metal trace lines.
 30. The method of claim 27, wherein thefirst hierarchy level and the second hierarchy level are the samehierarchy level.
 31. The method of claim 27, wherein identifying thesecond cell on the second hierarchy level that influencescharacteristics of the first cell includes identifying a second cell ona second hierarchy level including a second region to be modified thatis adjacent to the first region to be modified.
 32. The method of claim31, wherein prior to modifying the higher level cell, the first regionto be modified and the second region to be modified are both isolatedfrom other regions to be modified.
 33. The method of claim 27, whereinprinting the pattern of elements on a reticle substrate includesprinting the pattern of elements for a positive resist on a reticlesubstrate.
 34. A method of forming a pattern of elements on asemiconductor surface, comprising: forming a reticle, including:generating a number of cells that form a pattern of elements, the cellsbeing organized in a hierarchy; testing an area of a first cell, thearea surrounding a region to be modified; identifying a second cell thatinfluences characteristics of the first cell; moving a portion of thefirst cell that abuts or is contained within the area from the firstcell to a higher level cell in the hierarchy that is common with thesecond cell; moving at least a portion of the second cell to the higherlevel cell in the hierarchy, wherein the higher level cell is free ofexternal influences; modifying the region to be modified in the higherlevel cell; printing the pattern of elements on a reticle substrateafter modifying the region; and forming the pattern of elements on asemiconductor surface using the reticle.
 35. The method of claim 34,wherein generating the number of cells includes generating a number ofcells that include conductive elements with spaces defined between theconductive elements.
 36. The method of claim 35, wherein generating thenumber of cells that include conductive elements includes generating anumber of cells that include metal trace lines.
 37. The method of claim34, wherein the region to be modified includes a space between elementswith a space dimension to be modified.
 38. The method of claim 34,wherein testing the area of the first cell includes a region which issized larger than the region to be modified by a test distance.
 39. Themethod of claim 37, wherein testing the area of the first cell includestesting the area of the first cell to identify elements adjacent to thespace with a dimension larger that a threshold dimension.
 40. The methodof claim 34, wherein modifying the region to be modified includes movingedges of elements that are adjacent to the region to be modified. 41.The method of claim 34, wherein printing the pattern of elements on areticle substrate includes printing the pattern of elements for apositive resist on a reticle substrate.
 42. A machine-readable mediumwith instructions stored thereon, the instructions when executedoperable to cause: generation of a number of cells organized in ahierarchy; identification of a first cell including a region to bemodified on a first hierarchy level; identification of a second cell ona second hierarchy level that influences characteristics of the firstcell; moving of at least a portion of the first cell from the firsthierarchy level to a higher level cell in the hierarchy that is commonwith the second cell; moving of at least a portion of the second cellfrom the second hierarchy level to the higher level cell, wherein thehigher level cell is free of external influences; and modification ofthe higher level cell.
 43. The machine-readable medium of claim 42,wherein generation of the number of cells includes generation of anumber of cells that include a number of conductive elements whose edgesdefine a number of spaces between the elements.
 44. The machine-readablemedium of claim 43, wherein generation of the number of cells thatinclude the number of conductive elements includes generation of anumber of cells that include a number of metal trace lines.
 45. Themachine-readable medium of claim 42, wherein the first hierarchy leveland the second hierarchy level are the same hierarchy level.
 46. Themachine-readable medium of claim 42, wherein identification of thesecond cell on the second hierarchy level that influencescharacteristics of the first cell includes identification of a secondcell on a second hierarchy level including a second region to bemodified that is adjacent to the first region to be modified.
 47. Themachine-readable medium of claim 46, wherein prior to modification ofthe higher level cell, the first region to be modified and the secondregion to be modified are both isolated from other regions to bemodified.
 48. A machine-readable medium with instructions storedthereon, the instructions when executed operable to cause: generation ofa number of cells organized in a hierarchy; testing of an area of afirst cell, the area surrounding a region to be modified; identificationof a second cell that influences characteristics of the first cell;moving of a portion of the first cell that abuts or is contained withinthe area from the first cell to a higher level cell in the hierarchythat is common with the second cell; moving of at least a portion of thesecond cell to the higher level cell in the hierarchy, wherein thehigher level cell is free of external influences; modification of theregion to be modified in the higher level cell.
 49. The machine-readablemedium of claim 48, wherein generation of the number of cells includesgeneration of a number of cells that include conductive elements withspaces defined between the conductive elements.
 50. The machine-readablemedium of claim 49, wherein generation of the number of cells thatinclude conductive elements includes generation of a number of cellsthat include metal trace lines.
 51. The machine-readable medium of claim48, wherein the region to be modified includes a space between elementswith a space dimension to be modified.
 52. The machine-readable mediumof claim 48, wherein testing of the area of the first cell includes aregion which is sized larger than the region to be modified by a testdistance.
 53. The machine-readable medium of claim 51, wherein testingof the area of the first cell includes testing of the area of the firstcell to identify elements adjacent to the space with a dimension largerthat a threshold dimension.
 54. The machine-readable medium of claim 48,wherein modification of the region to be modified includes moving ofedges of elements that are adjacent to the region to be modified.
 55. Apattern generating system, comprising: a processor; a memory, containinginstructions thereon, the instructions when executed operable to cause:generation of a number of cells organized in a hierarchy; identificationof a first cell including a region to be modified on a first hierarchylevel; identification of a second cell on a second hierarchy level thatinfluences characteristics of the first cell; moving of at least aportion of the first cell from the first hierarchy level to a higherlevel cell in the hierarchy that is common with the second cell; movingof at least a portion of the second cell from the second hierarchy levelto the higher level cell, wherein the higher level cell is free ofexternal influences; and modification of the higher level cell.
 56. Thepattern generating system of claim 55, wherein generation of the numberof cells includes generation of a number of cells that include a numberof conductive elements whose edges define a number of spaces between theelements.
 57. The pattern generating system of claim 56, whereingeneration of the number of cells that include a number of conductiveelements includes generation of a number of cells that include a numberof metal trace lines.
 58. The pattern generating system of claim 55,wherein the first hierarchy level and the second hierarchy level are thesame hierarchy level.
 59. The pattern generating system of claim 55,wherein identification of the second cell on the second hierarchy levelthat influences characteristics of the first cell includesidentification of a second cell on a second hierarchy level including asecond region to be modified that is adjacent to the first region to bemodified.
 60. The pattern generating system of claim 59, wherein priorto modification of the higher level cell, the first region to bemodified and the second region to be modified are both isolated fromother regions to be modified.
 61. A pattern generating system,comprising: a processor; a memory, containing instructions thereon, theinstructions when executed operable to cause: generation of a number ofcells organized in a hierarchy; testing of an area of a first cell, thearea surrounding a region to be modified; identification of a secondcell that influences characteristics of the first cell; moving of aportion of the first cell that abuts or is contained within the areafrom the first cell to a higher level cell in the hierarchy that iscommon with the second cell; moving of at least a portion of the secondcell to the higher level cell in the hierarchy, wherein the higher levelcell is free of external influences; modification of the region to bemodified in the higher level cell.
 62. The pattern generating system ofclaim 61, wherein generation of the number of cells includes generationof a number of cells that include conductive elements with spacesdefined between the conductive elements.
 63. The pattern generatingsystem of claim 62, wherein generation of the number of cells thatinclude conductive elements includes generation of a number of cellsthat include metal trace lines.
 64. The pattern generating system ofclaim 61, wherein the region to be modified includes a space betweenelements with a space dimension to be modified.
 65. The patterngenerating system of claim 61, wherein testing of the area of the firstcell includes a region which is sized larger than the region to bemodified by a test distance.
 66. The pattern generating system of claim64, wherein testing of the area of the first cell includes testing ofthe area of the first cell to identify elements adjacent to the spacewith a dimension larger that a threshold dimension.
 67. The patterngenerating system of claim 61, wherein modification of the region to bemodified includes moving of edges of elements that are adjacent to theregion to be modified.